Abstract
Random effects in the repeatability of refractive index and absorption edge position of tantalum pentoxide layers prepared by plasma-ion-assisted electron-beam evaporation, ion beam sputtering, and magnetron sputtering are investigated and quantified. Standard deviations in refractive index between and have been obtained. Here, lowest standard deviations in refractive index close to our detection threshold could be achieved by both ion beam sputtering and plasma-ion-assisted deposition. In relation to the corresponding mean values, the standard deviations in band-edge position and refractive index are of similar order.
© 2017 Optical Society of America
Full Article | PDF ArticleMore Like This
Olaf Stenzel, Steffen Wilbrandt, Mark Schürmann, Norbert Kaiser, Henrik Ehlers, Mathias Mende, Detlev Ristau, Stefan Bruns, Michael Vergöhl, Markus Stolze, Mario Held, Hansjörg Niederwald, Thomas Koch, Werner Riggers, Peer Burdack, Günter Mark, Rolf Schäfer, Stefan Mewes, Martin Bischoff, Markus Arntzen, Frank Eisenkrämer, Marc Lappschies, Stefan Jakobs, Stephan Koch, Beate Baumgarten, and Andreas Tünnermann
Appl. Opt. 50(9) C69-C74 (2011)
Olaf Stenzel, Steffen Wilbrandt, Shan Du, Christian Franke, Norbert Kaiser, Andreas Tünnermann, Mathias Mende, Henrik Ehlers, and Mario Held
Opt. Mater. Express 4(8) 1696-1707 (2014)
O. Stenzel, J. Harhausen, D. Gäbler, S. Wilbrandt, C. Franke, R. Foest, and N. Kaiser
Opt. Mater. Express 5(9) 2006-2023 (2015)