Abstract
The B4C/Mo/Si high reflectivity multilayer mirror was designed for He-II radiation (30.4 nm) using the layer-by-layer method. The theoretical peak reflectivity was up to 38.2% at the incident angle of 5 degrees. The B4C/Mo/Si multilayer was fabricated by direct current magnetron sputtering and measured at the National Synchrotron Radiation Laboratory (NSRL) of China. The experimental reflectivity of the B4C/Mo/Si multilayer at 30.4 nm was about 32.5%. The promising performances of the B4C/Mo/Si multilayer mirror could be used for the construction of solar physics instrumentation.
© 2006 Chinese Optics Letters
PDF Article
More Like This
High reflectivity multilayer for He-II radiation at 30.4 nm
Jingtao Zhu, Zhanshan Wang, Zhong Zhang, Fengli Wang, Hongchang Wang, Wenjuan Wu, Shumin Zhang, Da Xu, Lingyan Chen, Hongjun Zhou, Tonglin Huo, Mingqi Cui, and Yidong Zhao
Appl. Opt. 47(13) C310-C314 (2008)
Cited By
You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Login to access Optica Member Subscription