Abstract
In this paper we present a practical approach to the analysis of spectra
recorded from a table-top reflectometer operating in the extreme ultraviolet (UV)
spectral range. Such in-lab tools, which utilize light from plasma based sources,
are currently under investigation for a broad range of applications such as surface
and thin-film analysis, near-edge X-ray absorption fine structure (NEXAFS) studies,
or reflectivity measurements. In a polychromatic approach one is able to record
surface-sensitive reflectometric spectra that are characteristic for each material
or thin-film-layer stack. By monitoring the incident and emergent spectrum before
and after the sample using two independent detectors, one can deduce its
reflectivity. However, the analysis of the raw data, in terms of digitized
spectrometric intensity values, can be difficult due to the nature of the
quasi-continuous emission from such plasma sources, particularly with xenon, which
is a good broad-band radiator in the 10–20 nm spectral range. The complexity of
configurations involved in transitions of highly ionized xenon makes a line-by-line
analysis very difficult as the real spectrum consists of thousands of unresolved
transitions superimposed by distinctive lines. Additionally, sampling issues,
detector geometry, and minor setup misalignments can distort the result. We propose
a practical algorithm for spectral decomposition and sharpening of such data.
Measurement results are presented that confirm the functionality of the algorithm.
PDF Article
More Like This
Cited By
You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Login to access Optica Member Subscription