Abstract
The influence of residual gas pressure and of deposition rate on the refractive index of Na3AlF6 and ThF4 films was investigated. Transition from high to medium deposition rates causes a distinct decrease of the refractive index, but a further reduction of the deposition rate gives practically no additional change. Increasing the residual gas pressure from 2 or 4 × 10−6 to 2 × 10−5 torr has no influence on the refractive index although at 2 × 10−4 torr a lower value was measured. The refractive indices of Na3AlF6, ThF4, and ZnSe coatings deposited on Ag and Al films were found to be essentially the same as those obtained on dielectric multilayers.
© 1968 Optical Society of America
Full Article |
PDF Article
More Like This
Cited By
You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Login to access Optica Member Subscription
Figures (1)
You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Login to access Optica Member Subscription
Tables (2)
You do not have subscription access to this journal. Article tables are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Login to access Optica Member Subscription
Equations (2)
You do not have subscription access to this journal. Equations are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Login to access Optica Member Subscription