Abstract
A linear measurement model of lithographic projection lens aberrations is studied numerically based on the Hopkins theory of partially-coherent imaging and positive resist optical lithography (PROLITH) simulation. In this linearity model, the correlation between the mark’s structure and its sensitivities to aberrations is analyzed. A method to design a mark with high sensitivity is proved and declared. By use of this method, a translational-symmetry alternating phase shifting mask (Alt-PSM) grating mark is redesigned with all of the even orders, rd and th order diffraction light missing. In the evaluation simulation, the measurement accuracies of aberrations prove to be enhanced apparently by use of the redesigned mark instead of the old ones.
© 2009 Optical Society of America
Full Article | PDF ArticleMore Like This
Zicheng Qiu, Xiangzhao Wang, Qiongyan Yuan, and Fan Wang
Appl. Opt. 48(2) 261-269 (2009)
Bo Peng, Xiangzhao Wang, Zicheng Qiu, Yuting Cao, and Lifeng Duan
Appl. Opt. 49(15) 2753-2760 (2010)
Fan Wang, Xiangzhao Wang, Mingying Ma, Dongqing Zhang, Weijie Shi, and Jianming Hu
Appl. Opt. 45(2) 281-287 (2006)