Abstract
We have fabricated large, coarsely ruled, echelle patterns on silicon wafers by using photolithography and chemical-etching techniques. The grating patterns consist of 142-µm-wide, V-shaped grooves with an opening angle of 70.6°, blazed at 54.7°. We present a detailed description of our grating-fabrication techniques and the results of extensive testing. We have measured peak diffraction efficiencies of 70% at λ = 632.8 nm and conclude that the gratings produced by our method are of sufficient quality for use in high-resolution spectrographs in the visible and near IR (λ ≃ 500–5000 nm).
© 2000 Optical Society of America
Full Article | PDF ArticleMore Like This
J. P. Marsh, D. J. Mar, and D. T. Jaffe
Appl. Opt. 46(17) 3400-3416 (2007)
George R. Harrison, Erwin G. Loewen, and Robert S. Wiley
Appl. Opt. 15(4) 971-976 (1976)
Nicholas Kruczek, Drew M. Miles, Brian Fleming, Randall McEntaffer, Kevin France, Fabien Grisé, and Stephan McCandliss
Appl. Opt. 61(22) 6430-6442 (2022)